GeO2/Ge structure submitted to annealing in deuterium: Incorporation pathways and associated oxide modifications
Author:
Affiliation:
1. PGMICRO, UFRGS, 91509-900 Porto Alegre, Rio Grande do Sul, Brazil
2. Instituto de Física, UFRGS, 91509-900 Porto Alegre, Rio Grande do Sul, Brazil
3. Instituto de Química, UFRGS, 91509-900 Porto Alegre, Rio Grande do Sul, Brazil
Funder
CAPES
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4898062
Reference30 articles.
1. High-k/Ge MOSFETs for future nanoelectronics
2. Preamorphization implantation-assisted boron activation in bulk germanium and germanium-on-insulator
3. Comparison of drive currents in metal-oxide-semiconductor field-effect transistors made of Si, Ge, GaAs, InGaAs, and InAs channels
4. Academic and industry research progress in germanium nanodevices
5. Challenges and opportunities in advanced Ge pMOSFETs
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Rational design of germanium–copper based nanocomposite anodes for high-performance lithium-ion storage;Journal of Alloys and Compounds;2024-08
2. Interface band alignment of amorphous Ga2O3/Ge heterojunctions fabricated by atomic layer deposition;Optical Materials;2024-04
3. Optimized chalcogenide medium for inherently activated resistive switching device;Applied Surface Science;2023-12
4. SiO 2 –GeO 2 Glass–Ceramic Flakes as an Anode Material for High‐Performance Lithium‐Ion Batteries;Energy Technology;2022-06-02
5. Structural and electronic rearrangement in ovonic switching GexSe1-x(0,4 ≤ x ≤ 0,72) films;Solid-State Electronics;2021-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3