Effect of electric field on amorphous silicon thin films during Ni induced lateral crystallization
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4811350
Reference23 articles.
1. Recrystallization of amorphized polycrystalline silicon films on SiO2: Temperature dependence of the crystallization parameters
2. Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films
3. Recrystallization of amorphous silicon films deposited by low‐pressure chemical vapor deposition from Si2H6gas
4. Crystallization of LPCVD Silicon Films by Low Temperature Annealing
5. UV Pulsed Laser Annealing of Si+Implanted Silicon Film and Low-Temperature Super-Thin Film Transistors
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1. Room temperature fabrication of poly-crystalline Si thin films via Al-induced crystallization under 500 keV Xe+ ion irradiation;Journal of Applied Physics;2022-09-07
2. Crystallization characteristics in heavily B2H6-doped amorphous Si thin films;Journal of Alloys and Compounds;2019-09
3. Inclusions in Si whiskers grown by Ni metal induced lateral crystallization;Journal of Applied Physics;2017-04-14
4. Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films;Scientific Reports;2016-09-07
5. Electron Microscopy Study on the Influence of B-implantation on Ni Induced Lateral Crystallization in Amorphous Si1;Materials Today: Proceedings;2016
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