Recrystallization of amorphous silicon films deposited by low‐pressure chemical vapor deposition from Si2H6gas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347215
Reference10 articles.
1. High performance low-temperature poly-Si n-channel TFTs for LCD
2. High-performance thin-film transistors in low-temperature crystallized LPCVD amorphous silicon films
3. Effect of substrate temperature on recrystallization of plasma chemical vapor deposition amorphous silicon films
4. Growth and Physical Properties of LPCVD Polycrystalline Silicon Films
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