Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films-Reference-Cited by-同舟云学术

Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films

Published:2016-07 Issue:7 Volume:6 Page:075306
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Dimitrakellis P.,Kalampounias A. G.,Spiliopoulos N.,Amanatides E.,Mataras D.,Lahootun V.,Coeuret F.,Madec A.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4958918

Reference55 articles.

1. N. Wyrch, P. Torres, M. Goetz, S. Dubail, L. Feitknecht, J. Cuperus, A. Shah, B. Rech, O. Kluth, S. Wieder, O. Vetterl, H. Stiebig, C. Beneking, and H. Wagner, inProceedings 2nd World Conference on Photovoltaic Energy Conversion(Vienna, 1998), Vol.I, p. 467.

2. K. Saito, M. Sano, K. Matsuda, T. Kondo, T. Nishimoto, K. Ogawa, and I. Kajita, inProceedings 2nd World Conference on Photovoltaic Energy Conversion(Vienna, 1998), Vol.I, p. 351.

3. High-efficiency microcrystalline silicon single-junction solar cells

4. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?

5. Optical and transport studies on thin microcrystalline silicon films prepared by very high frequency glow discharge for solar cell applications

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electronic structure of P-type amorphous silicon nanowires;Physica Scripta;2023-09-21

2. N-type H2-doped amorphous silicon layer for solar-cell application;Materials for Renewable and Sustainable Energy;2023-04-12

3. Disilane addition versus silane-hydrogen flow rate effect on the PECVD of silicon thin films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-11