Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4759450
Reference38 articles.
1. Multilayer mirror technology for soft-x-ray projection lithography
2. Molybdenum-silicon multilayer mirrors for the extreme ultraviolet
3. Nanometer interface and materials control for multilayer EUV-optical applications
4. Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance
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