Funder
Russian Science Foundation
Subject
Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry
Reference39 articles.
1. High-reflection Mo/Be/Si multilayers for EUV lithography;Chkhalo;Opt. Lett.,2017
2. Multilayer mirror technology for soft-x-ray projection lithography;Stearns;Appl. Opt.,1993
3. Fred Bijkerk, Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics;Huang;Appl. Phys. Rev.,2017
4. Stress, microstructure, and stability of Mo/Si, W/Si, and Mo/C multilayer films;Windt;J. Vac. Sci. Technol. A,2000
5. Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography;Chkhalo;J. Vac. Sci. Technol. B,2017
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献