Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography-Reference-Cited by-同舟云学术

Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography

Published:2017-11 Issue:6 Volume:35 Page:062002
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Chkhalo Nikolay¹,Polkovnikov Vladimir¹,Salashchenko Nikolay¹,Toropov Mikhail¹

Affiliation:

1. Institute for Physics of Microstructures of RAS, GSP-105, Nizhny Novgorod 603950, Russia

Funder

Russian Foundation for Basic Research (RFBR)

Russian Science Foundation (RSF)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4995369

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