Mechanism of the growth of amorphous and microcrystalline silicon from silicon tetrafluoride and hydrogen
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345600
Reference10 articles.
1. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
2. a-Si and μc-Si Grown from SiF4 with High H2 Dilution in a DC Glow Discharge
3. Growth of Amorphous and Crystalline Silicon by HR-CVD (Hydrogen Radical Enhanced CVD)
4. Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon
5. Preparation of α-(Si.Ge):H Alloys by D.C. Glow Discharge Deposition
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