Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas
Author:
Affiliation:
1. Korea Research Institute of Standards and Science, Daejeon 34113, South Korea
2. Department of Electrical Engineering, Hanyang University, Seoul 133-791, South Korea
Funder
R&D Convergence Program of Korea
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5110219
Reference42 articles.
1. Principles of Plasma Discharges and Materials Processing
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5. Collisionless heating in radio-frequency discharges: a review
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