Mutual influence of the channels in a combined discharge based on the RF inductive and DC discharges-Reference-Cited by-同舟云学术

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Mutual influence of the channels in a combined discharge based on the RF inductive and DC discharges

Published:2022-04 Issue: Volume:198 Page:110873
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kralkina E.A.^ORCID,Nekludova P.A.,Nikonov A.M.,Vavilin K.V.,Zadiriev I.I.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference41 articles.

1. Principles of Plasma Discharge and Material Processing;Lieberman,2005

2. Design of high density plasma sources;Lieberman;Phys. Thin Films,1994

3. Physics of Radio–Frequency Plasmas;Chamber,2011

4. Plasma etching: yesterday, today, and tomorrow;Donnelly;J. Vac. Sci. Technol.,2013

5. Helicon Plasma Sources, High Density Plasma Sources;Chen,1996

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