Selective removal of a Si0.7Ge0.3layer from Si(100)
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105067
Reference7 articles.
1. A Si0.7Ge0.3strained‐layer etch stop for the generation of thin layer undoped silicon
2. Fabrication of Bond and Etch‐Back Silicon on Insulator Using a Strained Si0.7Ge0.3 Layer as an Etch Stop
3. Chemical Etching of Silicon
4. Wet oxidation of GeSi strained layers by rapid thermal processing
5. Chemical Etching of Silicon
Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Enhancement of selective SiGe dissolution through facilitated surface oxidation by formation of hydroxyl radicals in peracetic acid solution;Applied Surface Science;2024-01
2. Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing;Solid State Phenomena;2023-08-14
3. Selective Digital Etching of Silicon–Germanium Using Nitric and Hydrofluoric Acids;ACS Applied Materials & Interfaces;2020-09-24
4. Selective chemical wet etching of Si1-xGex versus Si in single-layer and multi-layer with HNO3/HF mixtures;Thin Solid Films;2020-09
5. Selective Wet Etching of Silicon Germanium in Composite Vertical Nanowires;ACS Applied Materials & Interfaces;2019-09-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3