Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371292
Reference32 articles.
1. Doping of amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition using phosphine and trimethylboron
2. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
3. Amorphous Silicon Electronics
4. Amorphous and microcrystalline silicon films obtained by hot-wire chemical vapour deposition using high filament temperatures between 1900 and 2500°C
5. Hydrogen content and density of plasma‐deposited amorphous silicon‐hydrogen
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