Very low-temperature growth of silicon thin films using chlorinated precursors and optical properties-Reference-Cited by-同舟云学术

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Very low-temperature growth of silicon thin films using chlorinated precursors and optical properties

Published:2020-03 Issue: Volume:108 Page:104859
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Linares Javitt,López-Suárez A.,Ramos C.,Picquart M.,García-Sánchez M.F.,Dutt A.,Santana G.

Funder

IPN

CONACyT

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference43 articles.

1. Exceeding conversion efficiency of 26% by heterojunction interdigitated back contact solar cell with thin film Si technology;Yoshikawa;Sol. Energy Mater. Sol. Cells,2017

2. “Effect of deposition temperature on polymorphous silicon thin films by PECVD : role of hydrogen;Hamui;Mater. Sci. Semicond. Process.,2016

3. Properties of a new a-Si:H-like material: hydrogenated polymorphous silicon;Longeaud;J. Non-Cryst. Solids,1998

4. Structural properties depicted by optical measurements in hydrogenated polymorphous silicon;Vignoli;J. Phys. Condens. Matter,1999

5. Cabarrocas, “Influence of N-type μ c-SiOx:H intermediate reflector and top cell material properties on the electrical performance of ‘micromorph’ tandem solar cells;Chatterjee;AIP Adv.,2018

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of Power on Crystallinity and Opto-Electronic Properties of Silicon Thin Films Grown Using VHF PECVD Process;Silicon;2020-09-14

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