Lattice diffusion and surface segregation of B during growth of SiGe heterostructures by molecular beam epitaxy: Effect of Ge concentration and biaxial stress-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Lattice diffusion and surface segregation of B during growth of SiGe heterostructures by molecular beam epitaxy: Effect of Ge concentration and biaxial stress

Published:2004-09-15 Issue:6 Volume:96 Page:3158-3163
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Portavoce A.,Gas P.,Berbezier I.,Ronda A.,Christensen J. S.,Svensson B.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1781767

Reference19 articles.

1. Sb surface segregation during epitaxial growth of SiGe heterostructures: The effects of Ge composition and biaxial stress

2. Sb lattice diffusion inSi1−xGex/Si(001)heterostructures: Chemical and stress effects

3. Alloy surfaces: segregation, reconstruction and phase transitions

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interdiffusion of Al and Ga in AlN/AlGaN superlattices grown by ammonia-assisted molecular beam epitaxy;Superlattices and Microstructures;2021-02

2. Effects of high in-situ source/drain boron doping in p-FinFETs on physical and device performance characteristics;Materials Science in Semiconductor Processing;2018-08

3. Role of Atomic Transport Kinetic on Nano-Film Solid State Growth;Diffusion Foundations;2018-07

4. Electron holography of devices with epitaxial layers;Journal of Applied Physics;2014-11-07

5. Tungsten diffusion in silicon;Journal of Applied Physics;2014-01-07

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP