Pattern formation on ion-irradiated Si surface at energies where sputtering is negligible-Reference-Cited by-同舟云学术

Pattern formation on ion-irradiated Si surface at energies where sputtering is negligible

Published:2018-06-21 Issue:23 Volume:123 Page:235108
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Lopez-Cazalilla A.¹^ORCID,Chowdhury D.²^ORCID,Ilinov A.¹,Mondal S.²³,Barman P.²⁴,Bhattacharyya S. R.²,Ghose D.²,Djurabekova F.¹⁵^ORCID,Nordlund K.¹^ORCID,Norris S.⁶

Affiliation:

1. Department of Physics, University of Helsinki, P.O. Box 43, FIN-00014 Helsinki, Finland

2. Saha Institute of Nuclear Physics, Sector – I, Block – AF, Bidhan Nagar, Kolkata 700064, India

3. Maharaja Manindra Chandra College, 20 Ramkanto Bose Street, Kolkata 700003, India

4. Homi Bhaba National Institute, Training School Complex, Anushakti Nagar, Mumbai 400094, India

5. Helsinki Institute of Physics, Helsinki, Finland

6. Department of Mathematics, Southern Methodist University, Dallas, Texas 75205, USA

Funder

Helsingin Yliopisto

Academy of Finland

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5026447

Reference46 articles.

1. Making waves: Kinetic processes controlling surface evolution during low energy ion sputtering

2. J. Muñoz-García , L. Vázquez , R. Cuerno , J. Sánchez-García , M. Castro , and R. Gago , “Self-organized surface nanopatterning by ion beam sputtering,” inToward Functional Nanomaterials, Lecture Notes on Nanoscale Science and Technology Vol. 5, edited by Z. M. Wang ( Springer, Dordrecht, 2009), Chap. 10, Vol. 10, p. 323.

3. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering

4. Nanostructuring surfaces by ion sputtering

5. Lateral Templating for Guided Self-Organization of Sputter Morphologies

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