Nanoscale pattern formation on surfaces by cluster ion beam irradiation

Abstract

Abstract Ion beam sputtering is a solid-surface nanostructuring procedure applicable to any type of material. In this study, we are interested in the bombardment of a metallic surface, specifically, of a Co(110) surface bombarded with Ar clusters at oblique incidence. The bombardment with clusters accentuates the effect of surface ripple formation. Sputter erosion and surface atomic redistribution are the processes that determine the morphological evolution of the surface from the collisional point of view. The importance of these processes was analyzed for different angles of incidence in the bombardment with very small clusters and atoms while always maintaining the same fluence. The sputter yield increases with the number of atoms in the cluster for angles greater than 50°; while for the rest, it barely experiences any increase. Unlike sputtering, displacements increase as the cluster size increases above the critical angle. Moreover, horizontal displacement only shows some sign of saturation for angles close to the normal. An analysis of redistributed volumes and previous data suggest that sputtering drives the ripple effect for grazing angles and ones close to these. It is also responsible for the enhancement effect in the cluster bombardment. For the rest of the angles, the weight of the redistribution is decisive. There is a proportional relationship between the emptied volume and the horizontal displacement.