Kinetics of arsenic activation and clustering in high dose implanted silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96607
Reference5 articles.
1. Solid solubility of As in Si as determined by ion implantation and cw laser annealing
2. Rapid Thermal Annealing in Si
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4. Kinetics and Mechanisms of Solid Phase Epitaxy and Competitive Processes in Silicon
5. The Diffusion of Ion‐Implanted Arsenic in Silicon
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