Quantitative determination of mass-resolved ion densities in H2-Ar inductively coupled radio frequency plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4794165
Reference66 articles.
1. Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma
2. Modeling and analysis of hydrogen–methane plasma in electron cyclotron resonance chemical vapor deposition of diamond-like carbon
3. Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures
4. Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties
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