Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference45 articles.
1. Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
2. Plasma uniformity of inductively coupled plasma reactor with helical heating coil
3. Silicon and germanium nanoparticle formation in an inductively coupled plasma reactor
4. Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition
5. Measurements of rf bias effect in a dual electron cyclotron resonance-rf methane plasma using the Langmuir probe method
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