Characterization of an RF-excited broad beam ion source operated with a mixture of CHF3 and O2

Abstract

The composition and ion energy distributions of the main ion species of an ion beam were recorded and analyzed. The RF-type broad beam ion source was operated with a mixture of CHF3 and O2. A plasma bridge neutralizer operating with Ar was employed for ion beam neutralization. The data were collected with an energy-selective mass spectrometer (ESMS). The mass spectrum showed numerous ion species, beginning with ionized molecules, dissociation products of the process gases and products from reactions with background gas and the plasma discharge vessel, and the extraction system. For a quantification of the ion beam composition, the mass dependent transmission functions for two ESMS were determined. The ion energy distributions show that, in comparison to operation with inert gases, there are additional slower ions present. These ions can be related to dissociation processes outside of the ion beam source. As a result of their typically lower etching yield, these slower ions affect the etching behavior.