Surface Modification without Desorption: Recycling of Cl onSi(100)−(2×1)
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.88.125508/fulltext
Reference10 articles.
1. A Surface View of Etching
2. Intriguing kinetics for chlorine etching of the Si(100)-(2×1) surface
3. Mechanism for SiCl2Formation and Desorption and the Growth of Pits in the Etching of Si(100) with Chlorine
4. Application of Green’s-function technique to the calculation of multiphoton absorption coefficients of crystalline solids
5. Vacancy-Assisted Halogen Reactions onSi(100)-(2×1)
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1. Si epitaxy on Cl-Si(100);Applied Surface Science;2022-07
2. The stability of Cl-, Br-, and I-passivated Si(100)-(2 × 1) in ambient environments for atomically-precise pattern preservation;Journal of Physics: Condensed Matter;2021-08-23
3. Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds;Langmuir;2020-10-21
4. STM-Induced Desorption and Lithographic Patterning of Cl–Si(100)-(2 × 1);The Journal of Physical Chemistry A;2019-11-14
5. Evaluating Mechanisms of Adsorbate Induced Roughening in Si(100) with Monte Carlo Simulations;Topics in Catalysis;2011-01-27
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