Vacancy-Assisted Halogen Reactions onSi(100)-(2×1)
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.82.568/fulltext
Reference14 articles.
1. Surface science aspects of etching reactions
2. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
3. Laser single-photon ionization mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)
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