Si epitaxy on Cl-Si(100)
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference72 articles.
1. Atomic-precision advanced manufacturing for Si quantum computing;Bussmann;MRS Bull.,2021
2. A single-atom transistor;Fuechsle;Nat. Nanotechnol.,2012
3. Encapsulation of phosphorus dopants in silicon for the fabrication of a quantum computer;Oberbeck;Appl. Phys. Lett.,2002
4. Limits to metallic conduction in atomic-scale quasi-one-dimensional silicon wires;Weber;Phys. Rev. Lett.,2014
5. Ohm’s law survives to the atomic scale;Weber;Science,2012
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