Intriguing kinetics for chlorine etching of the Si(100)-(2×1) surface
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.479107
Reference18 articles.
1. Surface science aspects of etching reactions
2. Scanning Tunneling Microscopy Observations and Analysis of Thermal Etching of Si(100) with Br and Cl
3. Fundamental Aspects of the Reactions of Thermal and Hyperthermal F,F2, Cl, andCl2with Si Surfaces
4. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
5. Reactions of chlorine with Si(100) and Si(111): adsorption and desorption kinetics
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3. Etching-limiting process and origin of loading effects in silicon etching with hydrogen chloride gas;Japanese Journal of Applied Physics;2013-12-19
4. Bonding Structure, Dehydrogenation, and Dimerization of 1,3-C6H4 from Decomposition of 1,3-C6H4I2 on Cu(100);The Journal of Physical Chemistry C;2011-11-04
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