Structural and electronic property evolution of nickel and nickel silicide thin films on Si(100) from multicore x-ray-absorption fine-structure studies-Reference-Cited by-同舟云学术

Structural and electronic property evolution of nickel and nickel silicide thin films on Si(100) from multicore x-ray-absorption fine-structure studies

Published:1998-04-15 Issue:15 Volume:57 Page:9179-9185
ISSN:0163-1829
Container-title:Physical Review B
language:en
Short-container-title:Phys. Rev. B

Author:

Naftel S. J.,Coulthard I.,Sham T. K.,Das S. R.,Xu D.-X.

Publisher

American Physical Society (APS)

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.57.9179/fulltext

Reference21 articles.

1. Analysis of resistance behavior in Ti- and Ni-salicided polysilicon films

2. Electron detection EXAFS in He and vacuum

3. Total-electron-yield current measurements for near-surface extended x-ray-absorption fine structure

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