Structural analysis of high-energy implanted Ni atoms into Si(100) by X-ray absorption fine structure spectroscopy
-
Published:2022-10
Issue:
Volume:199
Page:110369
-
ISSN:0969-806X
-
Container-title:Radiation Physics and Chemistry
-
language:en
-
Short-container-title:Radiation Physics and Chemistry
Author:
Entani ShiroORCID,
Sato Shin-ichiro,
Honda Mitsunori,
Suzuki Chihiro,
Taguchi Tomitsugu,
Yamamoto Shunya,
Ohshima Takeshi
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献