Analysis of the electronic and local structure of amorphousSiNx:H alloy films in terms of SiK, SiL, and NKx-ray emission bands
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.49.5398/fulltext
Reference29 articles.
1. Electronic structure of hydrogenated and unhydrogenated amorphousSiNx (0≤x≤1.6): A photoemission study
2. Comments on ‘‘Electronic structure of hydrogenated and unhydrogenated amorphousSiNx(0≤x≤1.6): A photoemission study’’
3. Soft-x-ray emission spectroscopy study of the electronic structure of nonstoichiometric silicon nitride
4. EXAFS in amorphous silicon alloys
5. X-ray spectroscopic study of the electronic structure of amorphous SiNx:H (0.04 ≲ x ≲ 0.44)
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