Bulk molybdenum field emitters by inductively coupled plasma etching-Reference-Cited by-同舟云学术

Bulk molybdenum field emitters by inductively coupled plasma etching

Published:2016 Issue:48 Volume:18 Page:33152-33157
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Zhu Ningli¹²³⁴⁵,Cole Matthew T.⁵⁶⁷⁸^ORCID,Milne William I.⁵⁶⁷⁸⁹,Chen Jing¹²³⁴

Affiliation:

1. Institute of Microelectronics

2. Peking University

3. Beijing

4. P. R. China

5. Electrical Engineering Division

6. Department of Engineering

7. University of Cambridge

8. UK

9. College of Information Science and Electronic Engineering

Abstract

Processing conditions are herein explored for the etching of bulk Mo by inductively coupled plasma towards nano tip arrays for field electron emission applications.

Funder

Engineering and Physical Sciences Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2016/CP/C6CP06340C

Reference28 articles.

1. Fabrication of all-metal field emitter arrays with controlled apex sizes by molding

2. Highly Integrated Field Emitter Arrays Fabricated by Transfer Mold Technique

3. A Thin‐Film Field‐Emission Cathode

4. Physical properties of thin‐film field emission cathodes with molybdenum cones

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