A study on the influence of local doping in atomic layer deposited Al:ZnO thin film transistors-Reference-Cited by-同舟云学术

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A study on the influence of local doping in atomic layer deposited Al:ZnO thin film transistors

Published:2014-09-11 Issue:43 Volume:2 Page:9274-9282
ISSN:2050-7526
Container-title:J. Mater. Chem. C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Chung Yoon Jang,Choi Won Jin,Kang Seong Gu,Lee Chang Wan,Lee Jeong-O,Kong Ki-Jeong,Lee Young Kuk

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TC/C4TC01727G

Reference30 articles.

1. Atomic Layer Deposition: An Overview

2. Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials

3. Atomic layer deposition (ALD): from precursors to thin film structures

4. Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

5. Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films

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2. Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook;International Journal of Extreme Manufacturing;2023-02-03

3. Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors;Advanced Science;2022-06-16

4. Polycrystalline Indium Gallium Tin Oxide Thin-Film Transistors With High Mobility Exceeding 100 cm2/Vs;IEEE Electron Device Letters;2021-03

5. Tuning the inhomogeneous charge transport in ZnO interfaces for ultrahigh on/off ratio top-gated field-effect-transistor arrays;Nano Research;2020-08-08

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