Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials-Reference-Cited by-同舟云学术

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials

Published:2013-12 Issue:23-24 Volume:257 Page:3154-3176
ISSN:0010-8545
Container-title:Coordination Chemistry Reviews
language:en
Short-container-title:Coordination Chemistry Reviews

Author:

Lee Sang Woon,Choi Byung Joon,Eom Taeyong,Han Jeong Hwan,Kim Seong Keun,Song Seul Ji,Lee Woongkyu,Hwang Cheol Seong

Funder

National Research Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Physical and Theoretical Chemistry,Inorganic Chemistry

Reference119 articles.

1. Applications of atomic layer deposition to nanofabrication and emerging nanodevices

2. Gas diffusion barriers on polymers using Al2O3 atomic layer deposition

3. Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices

4. Creation and Control of Two-Dimensional Electron Gas Using Al-Based Amorphous Oxides/SrTiO3 Heterostructures Grown by Atomic Layer Deposition

5. In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

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