Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review

Author:

Kim Se Eun,Sung Ju Young,Yun Yewon,Jeon Byeongjun,Moon Sang Mo,Lee Han Bin,Lee Chae Hyun,Jung Hae Jun,Lee Jae-Ung,Lee Sang Woon

Funder

Korea Ministry of Trade Industry and Energy

National Research Foundation of Korea

Ajou University

Ministry of Science, ICT and Future Planning

Publisher

Elsevier BV

Reference48 articles.

1. Memory Technology enabling the next artificial intelligence revolution;Godse;2018 IEEE Nanotechnology Symposium (ANTS),2018

2. Toward advanced high‐k and electrode thin films for DRAM capacitors via atomic layer deposition;Kim;Adv. Mater. Technol.,2022

3. A review of trustworthy and explainable artificial intelligence (XAI);Chamola;IEEE Access,2023

4. Nonvolatile memory materials for neuromorphic intelligent machines;Jeong;Adv. Mater.,2018

5. Architecting an energy-efficient DRAM system for GPUs;Chatterjee;2017 IEEE International Symposium on High Performance Computer Architecture (HPCA),2017

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