Epitaxial growth of NbN thin films for electrodes using atomic layer deposition-Reference-Cited by-同舟云学术

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Epitaxial growth of NbN thin films for electrodes using atomic layer deposition

Published:2023-11 Issue: Volume:636 Page:157824
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Young Jang Seo,Min Lee Hye,Young Sung Ju,Eun Kim Se,Deock Jeon Jae,Yun Yewon,Mo Moon Sang,Eun Yoo Joung,Hyeon Choi Ji,Joo Park Tae,Woon Lee Sang

Funder

National Research Foundation of Korea

Ministry of Trade, Industry and Energy

Ministry of Science, ICT and Future Planning

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference47 articles.

1. Atomic layer deposition (ALD) of metal gates for CMOS;Zhao;Appl. Sci.,2019

2. Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications;Lee;ACS Appl. Electron. Mater.,2021

3. Arsenic-free ovonic threshold switch for next-generation selectors in 3-dimensional cross-point memories;Seo;Mater. Today Commun.,2021

4. An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3;Snyder;Thin Solid Films,2006

5. Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials;Lee;Coord. Chem. Rev.,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review;Current Applied Physics;2024-08

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