The growth and applications of silicides for nanoscale devices
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2012/NR/C1NR10847F
Reference62 articles.
1. Self-aligned nickel-mono-silicide technology for high-speed deep submicrometer logic CMOS ULSI
2. NiSi salicide technology for scaled CMOS
3. Salicidation process using NiSi and its device application
4. Barrier characteristics of Schottky diodes as determined from I-V-T measurements
5. Shallow silicide contact
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