Salicidation process using NiSi and its device application
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365410
Reference12 articles.
1. Self-aligned silicides or metals for very large scale integrated circuit applications
2. Incorporation of metal silicides and refractory metals in VLSI technology
3. Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/
4. Morphology and phase stability of TiSi2on Si
5. Self-aligned nickel-mono-silicide technology for high-speed deep submicrometer logic CMOS ULSI
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