Affiliation:
1. Department of Physics and Astronomy, Clemson University, Clemson, South Carolina 29634, USA
Abstract
We report on nano-patterning with multiply charged argon ions that facilitates the self-assembly of epitaxial [Formula: see text]Si nanostructures. In particular, we show that the impact sites formed from the dissipation of the incident ion potential energy for [Formula: see text] ([Formula: see text]) modulate the growth density and growth rate for silicide nanostructures. The observed nanostructure densities were found to vary as [Formula: see text] for strain-driven, shape transition-type growth, and the observed growth rates far exceeded those obtained under thermal conditions. Relating the growth density to an underlying sputter yield for [Formula: see text], we find a dependence on the ion potential energy relatively similar to that observed by others for [Formula: see text] ions incident on a thermally grown oxide.
Funder
Defense Advanced Research Projects Agency
Subject
General Physics and Astronomy