Design of efficient mono-aminosilane precursors for atomic layer deposition of SiO2 thin films-Reference-Cited by-同舟云学术

Design of efficient mono-aminosilane precursors for atomic layer deposition of SiO2 thin films

Author:

Huang Liang¹²³⁴⁵^ORCID,Han Bo⁵⁶⁷⁸⁴,Fan Maohong⁹¹⁰¹¹¹²,Cheng Hansong⁵⁶⁷⁸⁴

Affiliation:

1. The State Key Laboratory of Refractories and Metallurgy

2. Wuhan University of Science and Technology

3. Wuhan 430081

4. China

5. Sustainable Energy Laboratory

6. Faculty of Material Science and Chemistry

7. China University of Geosciences

8. Wuhan 430074

9. Department of Chemical and Petroleum Engineering

10. University of Wyoming

11. Laramie 82071

12. USA

Abstract

The suitability of six mono(alkylamino)silane precursors for growing SiO₂ films via ALD is assessed with DFT calculations.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

Reference52 articles.

1. Y. Nishi and R.Doering, Handbook of Semiconductor Manufacturing Technology, CRC Press, Boca Raton, FL, 2nd edn, 2007

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献