Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
Author:
Affiliation:
1. Tyndall National Institute; University College Cork; Lee Maltings; Dyke Parade Cork Ireland
2. George Washington University; Virginia Campus; 20101 Academic Way; Suite 333 Ashburn VA 20147 USA
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201504043/fullpdf
Reference118 articles.
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2. T. Suntola J. Antson Method for Producing Compound Thin Films, US 4 058430 1977
3. Atomic-scale simulation of ALD chemistry
4. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
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