Defect evolution in AlN templates on PVD-AlN/sapphire substrates by thermal annealing
Author:
Affiliation:
1. State Key Laboratory of Luminescence and Applications
2. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
3. Changchun 130033
4. People's Republic of China
5. University of Chinese Academy of Sciences
Abstract
In this work, we studied the mechanism of defects evolution in AlN templates on PVD-AlN/sapphire substrates by thermal annealing.
Funder
National Natural Science Foundation of China
Chinese Academy of Sciences
Publisher
Royal Society of Chemistry (RSC)
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2018/CE/C8CE00770E
Reference37 articles.
1. In situ observation of two-step growth of AlN on sapphire using high-temperature metal–organic chemical vapour deposition
2. High-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography
3. Near-UV electroluminescence in unipolar-doped, bipolar-tunneling GaN/AlN heterostructures
4. Overcoming the fundamental light-extraction efficiency limitations of deep ultraviolet light-emitting diodes by utilizing transverse-magnetic-dominant emission
5. Advances and prospects in nitrides based light-emitting-diodes
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