Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach
Author:
Affiliation:
1. School of Chemistry, AMBER and CRANN, Trinity College Dublin, Dublin, Ireland D02 AK60
2. Intel Ireland Ltd., Collinstown Industrial Park, Leixlip, Co. Kildare, Ireland W23 CX68
Funder
Science Foundation Ireland
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.0c09232
Reference42 articles.
1. Valence-band electron-tunneling measurement of the gate work function: Application to the high-κ/polycrystalline-silicon interface
2. Junctionless Nanowire Transistor (JNT): Properties and design guidelines
3. ITRS lithography roadmap: 2015 challenges
4. Technological merits, process complexity, and cost analysis of self-aligned multiple patterning
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Morphology Engineering of the Asymmetric PS-b-P4VP Block Copolymer: From Porous to Nanodot Oxide Structures;ACS Applied Polymer Materials;2023-11-02
2. Locally Thinned, Core–Shell Nanowire-Integrated Multi-gate MoS2 Transistors for Active Control of Extendable Logic;ACS Applied Materials & Interfaces;2022-12-23
3. Phase Transformation-Induced Quantum Dot States on the Bi/Si(111) Surface;ACS Applied Materials & Interfaces;2022-07-28
4. Thin film block copolymer self-assembly for nanophotonics;Nanotechnology;2022-04-29
5. Sub-25 nm Inorganic and Dielectric Nanopattern Arrays on Substrates: A Block Copolymer-Assisted Lithography;ACS Omega;2021-12-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3