Sub-25 nm Inorganic and Dielectric Nanopattern Arrays on Substrates: A Block Copolymer-Assisted Lithography
Author:
Affiliation:
1. School of Chemistry, AMBER and CRANN, Trinity College Dublin, Dublin D02 AK60, Ireland
Funder
Science Foundation Ireland
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c05124
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