Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films-Reference-Cited by-同舟云学术

Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films

Published:2020-01-08 Issue:4 Volume:12 Page:4678-4688
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Zyulkov Ivan¹²^ORCID,Madhiwala Viraj³,Voronina Ekaterina⁴^ORCID,Snelgrove Matthew⁵^ORCID,Bogan Justin⁵^ORCID,O’Connor Robert⁵,De Gendt Stefan¹²,Armini Silvia²^ORCID

Affiliation:

1. Department of Chemistry, Faculty of Science, KU Leuven, B-3001 Leuven, Belgium

2. Imec, Kapeldreef 75, B-3001 Leuven, Belgium

3. Faculty of Electrical Engineering and Information Technology, TU Chemnitz, 09107 Chemnitz, Germany

4. Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, GSP-1, Moscow 119991, Russian Federation

5. Dublin City University, Dublin 9, Ireland

Funder

Electronic Components and Systems for European Leadership

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.9b14596

Reference47 articles.

1. Spatial separation of photogenerated electrons and holes among {010} and {110} crystal facets of BiVO4

2. Site-Selective Deposition of Twinned Platinum Nanoparticles on TiSi2 Nanonets by Atomic Layer Deposition and Their Oxygen Reduction Activities

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4. High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling

5. A million spiking-neuron integrated circuit with a scalable communication network and interface

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