Area Selective Deposition of Ru on W/SiO<sub>2</sub> Nanopatterns via Sequential Reactant Dosing and Thermal Defect Correction-Reference-Cited by-同舟云学术

Area Selective Deposition of Ru on W/SiO₂ Nanopatterns via Sequential Reactant Dosing and Thermal Defect Correction

Published:2024-06-11 Issue:17 Volume:36 Page:8133-8140
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Qi Zilian¹,Li Haojie²,Cao Kun¹^ORCID,Gu Eryan¹,Wen Yanwei²^ORCID,Long Junzhou¹³,Shan Bin²^ORCID,Chen Rong¹^ORCID

Affiliation:

1. State Key Laboratory of Intelligent Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074 Hubei, People’s Republic of China

2. State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074 Hubei, People’s Republic of China

3. Hubei Yangtze Memory Laboratories, Wuhan, 430205 Hubei, People’s Republic of China

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

New Cornerstone Science Foundation

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.4c00475

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