Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition-Reference-Cited by-同舟云学术

Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition

Published:2021-04-15 Issue:16 Volume:13 Page:19398-19405
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Klement Philip¹^ORCID,Anders Daniel¹,Gümbel Lukas¹,Bastianello Michele¹,Michel Fabian¹,Schörmann Jörg¹,Elm Matthias T.¹²^ORCID,Heiliger Christian³,Chatterjee Sangam¹^ORCID

Affiliation:

1. Institute of Experimental Physics I and Center for Materials Research (ZfM/LaMa), Justus Liebig University Giessen, Heinrich-Buff-Ring 16, Giessen D-35392, Germany

2. Institute of Physical Chemistry, Justus Liebig University Giessen, Heinrich-Buff-Ring 17, Giessen D-35392, Germany

3. Institute of Theoretical Physics and Center for Materials Research (ZfM/LaMa), Justus Liebig University Giessen, Heinrich-Buff-Ring 16, Giessen D-35392, Germany

Funder

Bundesministerium f?r Bildung und Forschung

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c22121

Reference37 articles.

1. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

2. A Selective Toolbox for Nanofabrication