Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition-Reference-Cited by-同舟云学术

Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition

Published:2019-01-31 Issue:4 Volume:31 Page:1250-1257
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Mameli Alfredo¹^ORCID,Karasulu Bora¹²^ORCID,Verheijen Marcel A.¹,Barcones Beatriz¹³,Macco Bart¹^ORCID,Mackus Adriaan J. M.¹^ORCID,Kessels Wilhelmus M. M. Erwin¹^ORCID,Roozeboom Fred¹⁴

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. Department of Physics, Cavendish Laboratory, University of Cambridge, 19, J. J. Thomson Avenue, CB3 0HE Cambridge, U.K.

3. NanoLab@TUe, 5600 MB Eindhoven, The Netherlands

4. TNO-Holst Centre, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands

Funder

TNO-Holst Centre

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.8b03165

Reference43 articles.

1. Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning

2. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition

3. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

4. The use of atomic layer deposition in advanced nanopatterning

5. Chemistry for Positive Pattern Transfer Using Area-Selective Atomic Layer Deposition

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