Surface Roughness-Mediated Ordering in Block Copolymer Films toward Spatially Controlled Patterns-Reference-Cited by-同舟云学术

Surface Roughness-Mediated Ordering in Block Copolymer Films toward Spatially Controlled Patterns

Published:2017-08-15 Issue:17 Volume:50 Page:6840-6848
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Park Sungjune¹,Tsarkova Larisa A.²^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States

2. Faculty of Chemistry, Chair of Colloid Chemistry, Moscow State University, GSP-1, 1-3 Leninskiye Gory, 119991 Moscow 1, Russia

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.7b01185

Reference57 articles.

1. Patterning and Templating for Nanoelectronics

2. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

3. Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

4. Performance Enhancement of Electronic and Energy Devices via Block Copolymer Self-Assembly

5. Block copolymer self-assembly for nanophotonics

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