Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application-Reference-Cited by-同舟云学术

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Author:

Cummins Cian¹²,Ghoshal Tandra¹²,Holmes Justin D.²³,Morris Michael A.¹²

Affiliation:

1. Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland

2. AMBER@CRANN; Trinity College Dublin; Dublin Ireland

3. Materials Chemistry and Analysis Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

Reference247 articles.

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