Photo-directing chemoepitaxy: the versatility of poly(aryl methacrylate) films in tuning block copolymer wetting-Reference-Cited by-同舟云学术

Photo-directing chemoepitaxy: the versatility of poly(aryl methacrylate) films in tuning block copolymer wetting

Published:2021 Issue:21 Volume:12 Page:3201-3209
ISSN:1759-9954
Container-title:Polymer Chemistry
language:en
Short-container-title:Polym. Chem.

Author:

Zhao Jiacheng¹²³⁴⁵,McCallum Francis J.¹²³⁴⁵,Yu Ye¹²³⁴⁵,Fu Changkui¹²³⁴⁵,Kaitz Joshua A.⁶⁷⁸,Cameron James F.⁶⁷⁸,Trefonas Peter⁶⁷⁸,Blakey Idriss¹²³⁴^ORCID,Peng Hui¹²³⁴⁵,Whittaker Andrew K.¹²³⁴⁵^ORCID

Affiliation:

1. Australian Institute for Bioengineering and Nanotechnology

2. The University of Queensland

3. St Lucia

4. Australia

5. ARC Centre of Excellence in Convergent Bio-Nano Science and Technology

6. DuPont Electronics & Imaging

7. Marlborough

8. USA

Abstract

UV irradiated poly(aryl methacrylate) films can induce a change in the orientation of the domains of an overlayer of PS-b-PMMA from parallel to perpendicular lamellar structures.

Funder

Australian Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Organic Chemistry,Polymers and Plastics,Biochemistry,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2021/PY/D1PY00501D

Reference45 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

3. Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

4. Directing the self-assembly of block copolymers

5. Graphoepitaxy of Spherical Domain Block Copolymer Films

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