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Block copolymer self-assembly for nanophotonics

Published:2015 Issue:15 Volume:44 Page:5076-5091
ISSN:0306-0012
Container-title:Chemical Society Reviews
language:en
Short-container-title:Chem. Soc. Rev.

Author:

Stefik Morgan¹²³⁴,Guldin Stefan⁵⁶⁷⁸,Vignolini Silvia⁹¹⁰¹¹⁸,Wiesner Ulrich¹²¹³¹⁴⁴,Steiner Ullrich¹⁵¹⁶¹⁷¹⁸^ORCID

Affiliation:

1. Department of Chemistry and Biochemistry

2. University of South Carolina

3. Columbia

4. USA

5. Department of Chemical Engineering

6. University College London

7. London

8. UK

9. Department of Chemistry

10. University of Cambridge

11. Cambridge

12. Department of Materials Science & Engineering

13. Cornell University

14. Ithaca

15. Adolphe Merkle Institute

16. Chemin des Verdiers

17. 1700 Fribourg, CH

18. Switzerland

Abstract

From tunable reflectors to 3D metamaterials, the self-assembly of block copolymers is advancing nanostructures for photonic applications.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/CS/C4CS00517A

Reference156 articles.

1. H. L. Hsieh , Industrial Applications of Anionic Polymerization: An Introduction, American Chemical Society, 1998, ch. 3, pp. 28–33

2. Magnetism from conductors and enhanced nonlinear phenomena

3. Playing Tricks with Light

4. Thermodynamic Size Control of Block Copolymer Vesicles in Solution

5. Control of amphiphilic block copolymer morphologies using solution conditions

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