Crystal Growth and Photoluminescence Properties of Reactive CVD-Derived Monoclinic Hafnium Dioxide
Author:
Affiliation:
1. Institute of Solid State Chemistry and Mechanochemistry SB RAS, Kutateladze st. 18, Novosibirsk, 630128, Russian Federation
2. Nikolaev Institute of Inorganic Chemistry SB RAS, Lavrentiev ave. 3, Novosibirsk, 630090, Russian Federation
Funder
Russian Academy of Sciences
Publisher
American Chemical Society (ACS)
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.cgd.6b00824
Reference76 articles.
1. Characterization of Ultra-Thin Hafnium Oxide Films Grown on Silicon by Atomic Layer Deposition Using Tetrakis(ethylmethyl-amino) Hafnium and Water Precursors
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3. A Fully Transparent Resistive Memory for Harsh Environments
4. Development of hafnium based high-k materials—A review
5. Luminescence of intrinsic and extrinsic defects in hafnium oxide films
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