Characterization of Ultra-Thin Hafnium Oxide Films Grown on Silicon by Atomic Layer Deposition Using Tetrakis(ethylmethyl-amino) Hafnium and Water Precursors
Author:
Affiliation:
1. Laboratory for Surface Modification, Rutgers University, Piscataway, New Jersey 08854
2. SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741
3. SAFC, 5485 Country Road, Sheboygan Falls, Wisconsin 53085
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm061761p
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